Installation of the Vibration Restraint Foundation
  VERO is performing installation of raised floor and foundation (for a 100-ton TFT equipment) at a Phase 6 fabrication of a client
   
 
 
Record of Performance
  Project Name
 Time of Installation
 No. of Unit
1. Quanta Display Inc.
 March 2002
 50
2. InnoLux
 August 2004
 60
3. China Picture Tube L2
 February 2005
 120
4. China Picture Tube Y2
 March 2005
 50
5. Prime View Int’l
 May 2005
 20
6. Corning Taiwan
 July 2005
 150
 
 
Vibration Restraint Foundation
 
   
Foundation
   
   
 
Foundation
  For the ultra precision optical instrument , it is strictly necessary to shield the transmitted microscopic vibration from adjacent equipment and/or moving object.

For this purpose , a small spacing should be arranged along surroundings of equipment , and specially designed Foundation should be provided.

VERO can offer the most suitable Foundation system , which will be designed with dynamic analysis in total consideration of given environment condition, tolerable microvibration level for the equipment and seismic condition.
The product will be carefully manufactured in VERO factory and transported in completely finished product in compliance with transportation limit.
 
Criterion Curve
Amplitude
Detail
size
(μm)
Description of use
TYPE
Weight
Size
μinch/s
μm/s
dB
·Steel structure
·Concrete base mounted
·1~5 ton
·5-10ton
·10-30ton
·30-100ton etc.
·L2~4m
·w2~3.5m
·H0.5~2m
＆2~3m
VC-A
2000
50
66
8
Adequate in most instances for optical microscopes to 400x,microbalances,optical balances, proximity and projection aligners, etc.
VC-B
1000
25
60
3
Appropriate for inspection and lithography equipment (including steppers) to 3μm line widths
VC-C
500
12.5
54
1
Appropriate standard for optical microscopes to 1000x,lithography and inspection equipment (including moderately sensitive electron microscopes) to 1μm detail size, TFT-LCD stepper/scanner processes
VC-D
250
6
48
0.3
Suitable in most instances for demanding equipment, including many electron microscopes (SEMs and TEMs) and E-Beam systems.
VC-E
125
3
42
0.1
A challenging criterion to achieve. Assumed to be adequate for the most demanding of sensitive systems including long path, aser-based, small target systems, E-Beam lithography systems working at nanometer scales, and other systems requiring extraordinary dynamic stability.
Note : The area of AGV , RGV and STK , in which area vibration will be generated regularly , it should be provided small spacing (isolation gap) along the surroundings of equipment and specially designed raised floor system.